J&L Tech Co., Ltd. Company Logo J&L Tech Co., Ltd.

Carbozen-H SERIES, Hybrid CVD Coating Machine

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J&L Tech Co., Ltd.
[Korea]

Address
152, Byulmang-ro Danwon-gu, Ansan-city Gyeonggi-do
Phone
82-41-4991005
Contact name
Ulrim Yang

Quick Information

  • Brand Name: J&L Tech Co., Ltd
  • Place of Origin: Korea

Description

 

CARBOZENTM-H (Hybrid PVD) is a coating equipment which satisfies the customer's variety needs through a combination of Linear Ion Source and UBM sputter.
 
 ◆ System Specification
 
Chamber Size
ø600 x H600, ø700 x H900, ø800 x H1000,
ø1000 x H1000, ø1000 x H1200, Custom-made
Jig System Revolution and rotation type with 2 or 3 folds
 
Working Gas
Mass flow control system Ar, N2, O2, C2H2, CH4, C6H6, etc
Plasma Source Linear Ion Source, UBM Sputter
The Initial Vacuum Degree  
~ 10-6 Torr
Bias Power Pulsed DC
Heater Max 250˚C (Optional 450˚C)
Device Operation Automatic / Semi-automatic
 
 ◆ Advantages of Linear Ion Source

Provides stable ion energy during deposition
•Excellent coating layer forming even though large-area deposition
•Low maintenance costs
•Cleaning using Ar, O2, N2 gas

 
Ion Plating Rate 300 nm/min
Residual Stress ~ 2.0 GPa
Hardness ~ 28 GPa
Friction Coefficient ~ 0.1
 
  LIS350 LIS650 LIS800 LIS1000 LIS1200
Size (mm) W102 x H380 W102 x H680 W102 x H840 W102 x H1044 W102 x H1244
Type of Magnet Permanent magnet
Effective Area of Coating  
340 mm
 
656 mm
 
790 mm
 
990 mm
 
1190 mm
Coating Uniformity ± 3%
Discharge Voltage 500 ~ 3000 V
Operative Pressure 0.7 ~ 3 mTorr
Type of Gas Ar, N2, O2, C2H2, CH4, etc

◆ Advantages of UBM Sputter
•Able to deposit or alloys, compounds and insulating layers
•Possible to numerous reactive sputtering
•Uniformity of the deposition layer
•Possible to use on large target
•No macro-particles that cause matters to arc deposition
•Possible to use in low temperatures
•Easy to color coat on a thin film of oxide and metal nitride
  UBM350 UBM650 UBM850 UBM1050 UBM1200
Size (mm) W100 x H350 W100 x H680 W120 x H850 W120 x H1050 W120 x H1200
Type of Magnet Permanent magnet
Coating Uniformity ± 3%
Operative Pressure ‹ 30 mTorr


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