J&L Tech Co., Ltd. Company Logo J&L Tech Co., Ltd.

Carbozen-FA SERIES, Vacuum Arc Coating Machine

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J&L Tech Co., Ltd.
[Korea]

Address
152, Byulmang-ro Danwon-gu, Ansan-city Gyeonggi-do
Phone
82-41-4991005
Contact name
Ulrim Yang

Quick Information

  • Brand Name: J&L Tech Co., Ltd
  • Place of Origin: Korea

Description

The CARBOZENTM-FA( Filtered Cathodic Vacuum Arc) SERIES is an equipment for coating which utilizes an arc discharge, ion plating the Metallic targets of negative electrodes and coats the surface of the product. The biggest problem in the arc ion plating is a droplet (macro-particle) of µm size. This droplet reduces the properties of the thin film, in particular, surface roughness. CARBOZEN-FA of J&L TECH is a device for smoothing by attaching a magnetic filter to remove droplets.

◆ System Specification

Chamber Size ø600 x H600, Custom-made
Jig System  Rvolution and rotation with 2 or 3 fold
 
Working Gas
Mass flow control system Ar
Plasma Source FCVA Source
The Initial Vacuum Degree  
~ 10-6 Torr
Bias Power Pulsed DC
Heater Max 250˚C
Device Operation Automatic / Semi-automatic

◆ Advantages of FCVA Source
Droplet elimination and ultra-smooth surface through dual-bent duct filtering
•Large area coating through Beam-rastering
•Innovative electrode design for stable plasma beam
•High adhesion for the substrate
•High reproducibility and ease of maintenance


◆Characteristics of ta-C layer by Double Bent FCVA
Single bent Double bent
Deposition Rate 30 nm/min 5 nm/min
Surface Roughness (Ra)  
‹ 1.0 nm
 
‹ 0.5 nm
Hardness ~ 80 GPa ~ 80 GPa
Friction Coefficient ‹0.15 ‹0.15

◆ Specification of FCVA Source
  Single Bent                                                                Double Bent
 
Cathode
Material of the Target Graphite
Size ø75 x 25(L) mm
 
 
 
 
Duct
Size I.D.ø144mm, O.D.ø165.2mm
Angle 45°
Filtration Method Single   Double
  Magnet  Source magnet (SM), Bending magnet (BM), Output magnet(OM), Raster magnet(RM)    Source magnet (SM), Bending magnet (BM), Emission magnet(EM), Output magnet (OM), Raster magnet(RM)


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